詳細資料
產品名稱 : ASTRON®i AX7670
產品編號 : AX7670

ASTRON®i AX7670 Remote Plasma Source
(rated to 3.0 slm NF3 flow rate)


No Argon operation, high flow, increased ignition range capability

The ASTRON®i reactive gas generator is designed for increased flow capability and process flexibility. The ASTRONi reactive gas generator eliminates the need for argon during processing, allows a choice of ignition gas compatible with existing process gases, and increases overall flow for decreased processing time and increased throughput.

Based on patented Low-Field-Toroidal plasma technology, the ASTRONi reactive gas generator provides a broader range of operating pressures while maintaining a high input gas dissociation rate. The high reliability and field-proven design architecture combines the power source, control module, and plasma chamber. The result is a compact, lid-mountable unit, which is easy to integrate.

The primary application for ASTRONi reactive gas generator is as a remote source for reactive gas to clean undesired deposits from interior walls of CVD or FPD process chambers where greater process flexibility is required. By generating atomic fluorine that reacts with waste deposits in the chamber, new gases are formed that are readily scrubbed to minimize the environmental impact. In addition, the remote source reduces wear and tear on the process chamber compared to in-situ RF methods.